High‐voltage AlInN/GaN superjunction fin‐gate high electron mobility transistor for power‐switching application
نویسندگان
چکیده
منابع مشابه
Surface morphology of Al0.3Ga0.7N/Al2O3-high electron mobility transistor structure.
We present surface properties of buffer films (AIN and GaN) and Al0.3Gao.zN/Al2O3-High Electron Mobility Transistor (HEMT) structures with/without AIN interlayer grown on High Temperature (HT)-AIN buffer/Al2O3 substrate and Al2O3 substrate. We have found that the GaN surface morphology is step-flow in character and the density of dislocations was about 10(8)-10(9) cm(-2). The AFM measurements a...
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ژورنال
عنوان ژورنال: Micro & Nano Letters
سال: 2021
ISSN: ['1750-0443']
DOI: https://doi.org/10.1049/mna2.12059